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SUCCESSES
TECHNOLOGY
SALE
In a
recent
project undertaken by MP SYSTEMS, the Company located a semiconductor
equipment manufacturer who wished to develop a wafer cleaning tool
based on a new technology for cleaning semiconductor wafers using only
a dry
gas process -- the Sulfur Trioxide (SO3)
Cleaning
Process. MP SYSTEMS was able to facilitate the equipment
manufacturer's
access to the technology and to provide in-depth technical support for
the
development and implementation of the technology. This attractive, innovative Sulfur Trioxide dry-cleaning process for substrates such as semiconductor wafers and flat panel displays is based on the use of sulfur trioxide gas (SO3) and was first developed with the help of grants from the Department of Energy and the California Energy Commission. The SO3 process offers a simple technology for cleaning semiconductor wafers, flat-panel displays, and other microelectronic substrates at temperatures below 100º C and without the use of oxidizing plasmas or hazardous, liquid chemicals. As a consequence, this new, gas-phase cleaning technology has powerful advantages in capability, cost, and environmental impact over conventional cleaning and resist stripping methods. |
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